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调制周期对TaN/VN纳米多层膜的影响
Modulation Period and Nano TaN/VN Multilayers
【摘要】 本研究选择钽和钒的氮化物作为个体层材料,利用射频磁控溅射系统制备TaN、VN及一系列的TaN/VN多层薄膜。通过XRD和纳米力学测试系统分析了该体系合成以后的晶体结构、调制周期对力学性能的影响。结果表明:多层膜的纳米硬度值普遍高于两种个体材料混合相的硬度值;当调制周期为30 nm时TaN/VN多层膜达到最大硬度31 GPa,结晶出现多元化,多层膜体系的硬度、弹性模量以及耐磨性能均达到最佳效果。
【Abstract】 TaN/VN multilayers with a nanoscale modulation periold were grown by RF magnetron sputtering.It microstructures and mechanical properties were characterized with X-ray diffraction(XRD),a nano-indenter and a profiler.The results show that the multilayers have higher nanohardness than that of TaN,VN coatings,and their mixtures.The nanohardness of the multilayer,31 GPa,optimizes at a modulation period of 30 nm.Moreover,its elastic modulus and tribological property are also better than that of the multilayers with different modulation periods.
【Key words】 RF magnetron sputtering; TaN/VN multilayered coatings; Modulation period;
- 【文献出处】 真空科学与技术学报 ,Chinese Journal of Vacuum Science and Technology , 编辑部邮箱 ,2007年05期
- 【分类号】TB383.2
- 【被引频次】5
- 【下载频次】170