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电子束环氧基负胶的曝光反应机理分析
Analysis on Exposure Reaction Mechanism of Electron Beam Negative Resist with Epoxy Groups
【摘要】 从高分子辐射化学的角度对电子束环氧基负胶曝光的实际反应机理进行了深入的分析研究,通过Charlesby-Pinner关系式推导得出辐射交联反应中一些表征量(溶胶分数等)与辐射剂量的定量关系。通过SDS-Ⅱ型曝光机对环氧Epoxy618进行曝光实验,验证了上述结论的准确性,该论证结果用于指导电子束曝光参数的选取。
【Abstract】 Based on macromolecule radiation chemistry,the practical exposure reaction mechanism of electron beam negative resist with epoxy groups was analyzed.A relationship of the sol fraction with the radiation dose in the crosslinking reaction was deduced by the Charlesby-Pinner Equation and it was proved to be correct by the experiment which Epoxy618 was exposed by SDS-Ⅱ lithography systems,and it can be used for selection of electron beam exposure parameters.
【关键词】 电子束负胶;
环氧基团;
辐射交联;
溶胶分数;
Charlesby-Pinner关系式;
【Key words】 e-beam negative resist; epoxy group; radiation crosslinking; sol fraction; Charlesby-Pinner equation;
【Key words】 e-beam negative resist; epoxy group; radiation crosslinking; sol fraction; Charlesby-Pinner equation;
【基金】 山东省自然科学基金资助项目(Y2003G03)
- 【文献出处】 微细加工技术 ,Microfabrication Technology , 编辑部邮箱 ,2007年05期
- 【分类号】TN305.7
- 【下载频次】88