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水热法制备高折射率的HfO2光学薄膜
Preparation of High Refractive Index HfO2 Thin Films by Hydrothermal Synthesis
【摘要】 采用水热合成技术制备了HfO2胶体,用旋涂法镀制了单层HfO2介质膜.采用多种仪器设备对薄膜进行性能测试和表征,并用输出波长为1.06μm、脉宽为10 ns的电光调Q激光系统产生的强激光测试薄膜的激光损伤阈值.研究表明,水热合成技术制备的HfO2薄膜具有较高的激光损伤阈值、折射率和较好的平整度.对HfO2薄膜激光损伤形貌和成因进行了研究.
【Abstract】 HfO2 sol was obtained by hydrothermal synthesis.HfO2 thin films were prepared with spin coating method.HfO2 thin films were characterized or examined by many kinds of instruments.And 1-on-1 laser-induced damage threshold tests on HfO2 films were carried out with a Q-switched Nd-YAG high power laser at 1 064 nm with a pulse width of 10ns.The experimental results show that HfO2 thin films can achieve high refractive index,good surface micro morphology and excellent laser induced damage threshold.The morphologies of the laser-induced damage and the reason of it are investigated in the paper.
【Key words】 HfO2 films; hydrothermal synthesis; high refractive index; laser induced damage threshold;
- 【文献出处】 同济大学学报(自然科学版) ,Journal of Tongji University(Natural Science) , 编辑部邮箱 ,2007年12期
- 【分类号】O484
- 【被引频次】6
- 【下载频次】233