【摘要】 采用常压化学气相沉积(APCVD)技术在铝基底上成功制备了改性SiO_x陶瓷薄膜。通过显微硬度测试与涂层附着力自动划痕测试定量研究了薄膜显微硬度和膜基结合强度,利用光学显微镜(OM)和扫描电子显微镜(SEM)观察了薄膜的原始表面以及压痕、划痕形貌。结果表明,SiO_x膜层由大小不均匀的等轴状颗粒团聚堆垛而成,退火处理时长大或融合成片状;SiO_x薄膜有效提高纯铝表面的硬度,并能通过SiO_x薄膜变形以松弛表层应力,抑制脆性裂纹产生;划痕测试证明基底和薄膜具有很高的结合强度,薄膜与基底发生塑性变形而不剥离。更多还原

【Abstract】 Modified SiO_x films were prepared on aluminum surface by atmospheric pressure chemical vapor deposition (APCVD).The micro-hardness and bond strength were test by micro-Vickers hardness tester and scratch sound emission detector.The morphologies of as-deposit SiO_x film,scratch and indentation marks were observed by optical microscopy (OM) and scanning electronic microscopy (SEM).The SEM results show that the as-deposit SiO_x film is composed of agglomerated and/or stacked by a mass of SiO_x ceramic particles.The micro-Vickers hardness demonstrates the surface hardness of the aluminum is improved by deposit a layer of SiO_x film. OM morphology shows that the surface stress of the SiO_x film is relaxed by the collapse of agglomerated particles to avoid generating brittleness cracks.Scratch detector results indicate the bond strength between the film and substrate is very high.The SiOx film is plastic deformed with the aluminum substrate without any desquamation.更多还原