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R&D风险、创新环境与软件最优专利期限研究

R&D Risk,Innovation Environment and the Optimal Life of Software Patent

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【作者】 董雪兵王争

【Author】 Dong Xuebing and Wang Zheng (College of Economics, Zhejiang University)

【机构】 浙江大学经济学院浙江大学经济学院 邮政编码310027邮政编码310027

【摘要】 本文在Gilbert和Shapiro(1990)的分析框架基础上,借用社会福利贴现值的模型,并分别引入创新成功概率和创新效率来研究软件专利保护的最优期限问题。认为在给定回报率条件下对于具有不同投资风险、不同创新成功率的行业,设定专利保护期限的效果可能不同;随着行业创新效率的增加,最优专利期限首先增加,但是在达到最大值后开始趋于减小,因此有必要根据具体的产业基本特征尤其是行业创新效率的高低,分别设定不同的专利期限并给予不同的专利保护。最后本文还进行了简要的应用分析。

【Abstract】 Following Gilbert and Shapiro (1990), this paper employs the model of discounted social welfare to study the optimal patent life of software with two new variables: probability of successful innovation and innovation efficiency. We find that given the rate of return, the effect of given patent life would be different for the different industry with different investment risk and probability of successful innovation. When the innovation efficiency increases, the optimal patent life would first increase to its maximum, and then decrease. Therefore it is necessary to set industry-specific patent lives, implementing different patent protections according to the basic characteristics of the industry, especially the value of innovation efficiency. Finally, some issues related to policy application are tackled on at the end of the paper.

  • 【文献出处】 经济研究 ,Economic Research Journal , 编辑部邮箱 ,2007年09期
  • 【分类号】F416.672;F204
  • 【被引频次】58
  • 【下载频次】3071
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