节点文献
无紫外光照射下n型15R-SiC及6H-SiC晶体的电化学腐蚀
Electrochemical etching of n-type 15R-SiC and 6H-SiC without UV illumination
【摘要】 本文在无紫外光照射下通过电化学腐蚀法制备了多孔n型15R-及6H-SiC,并用扫描电子显微镜(SEM),拉曼散射及X射线衍射仪(XRD)对多孔层的结构进行了分析。结果表明:晶体的晶型及氧化条件等因素对多孔结构有较大影响。首次观察到多孔n型15-SiC的半圆管状结构,其孔隙率约是66%。
【Abstract】 The porous n-type 15R-SiC and 6H-SiC were prepared by electrochemical etching without external illumination.The porous layers were analyzed using scanning electron microscopy(SEM),Raman scattering,and X-ray diffraction(XRD). The porous structures depend on the crystal structure of substrates and anodization conditions.For the porous 15R-SiC,the semi-cylinder structure of the porous network has been observed and the porosity is about 66%.
【关键词】 多孔碳化硅;
电化学腐蚀;
拉曼散射;
x射线反射;
【Key words】 porous SiC; electrochemical etching; Raman scattering; x-ray reflectivity;
【Key words】 porous SiC; electrochemical etching; Raman scattering; x-ray reflectivity;
- 【文献出处】 光散射学报 ,The Journal of Light Scattering , 编辑部邮箱 ,2007年04期
- 【分类号】O613.72
- 【下载频次】140