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两种气体离子源氮离子注入细菌的诱变效应比较
Compare of N-ion implanation effects on Bacillus coagulans by use of two kinds of ion sourses
【摘要】 低能离子注入作为一种新的诱变育种手段已经得到广泛的应用。对考夫曼气体离子源和双潘宁气体离子源氮离子注入凝结芽孢杆菌的效果进行比较。经研究发现,在相同的引出电压下,考夫曼气体离子源注入的菌体到第三代的遗传稳定性要比双潘宁气体离子源注入的菌体高30%,但突变平均幅度要低2%,以此为依据可以根据不同诱变需要选择合适的离子源。
【Abstract】 As a novel method of mutation breeding,the low energy ion beam implantation has been widely used. The biological effects of Bacillus coagulans implanted by Kaufman source and dual-Panning source have been com- pared.The results showed that with the same extraction voltage,the genetic stability of the third generation strain im- planted by Kaufman source was 30% higher than that implanted by dual-Panning source,while the general mutation rate of the former was 2% lower than the latter.The appropriate ion source should be chosen to meet the requirement of mutation.
【Key words】 Kaufman sources; Dual-Panning sources; Ion implantation; Bacteria;
- 【文献出处】 辐射研究与辐射工艺学报 ,Journal of Radiation Research and Radiation Processing , 编辑部邮箱 ,2007年05期
- 【分类号】Q93
- 【被引频次】4
- 【下载频次】105