【摘要】 用溶胶-凝胶法制备均匀透明的TiO2薄膜,在400℃锻烧2h,再在一定浓度的硫酸中浸泡处理24h,最后在300℃、400℃、500℃进行第二次热处理0.5h.用X射线衍射、原子力显微镜、紫外-可见分光光度计表征了处理前后薄膜的晶相结构、表面形貌及薄膜的光学性能.研究了硫酸处理的浓度对薄膜光催化降解亚甲基兰溶液的影响.实验表明:用硫酸浸泡处理后的薄膜光催化性能有明显提高,而且增强了光催化剂的抗失活性能.XRD、光谱及AFM分析表明,导致TiO2薄膜光催化性能改善的原因是硫酸浸泡处理后的薄膜表面结构、晶粒尺寸发生了变化.硫酸的最佳浓度为0.4mol/L.更多还原

【Abstract】 The uniform transparent TiO2 nanometer thin film was prepared with sol-gel method at 400℃ for 2 h.The as-calcined TiO2 nanometer thin film was treated in different H2SO4 aqueous solution for 24 h.Finally, the treated TiO2 thin film was again heat-treated at300℃400℃、500℃ for 0.5h respectively.The structure of TiO2 thin film before and after tAS surface acid treatment was characterized by XRD、AFM、UV-vis. Studied the effect of concentration of H2SO4 on photodegradation of methylene blue, the results show that photocatalytic activity of treated TiO2 thin film was effectively enhanced.The analysis of XRD、 ultraviolet absorption and AFM show that the photocatalytic activity of TiO2 thin film depends strongly on the change of surface microstructure and size of particle. The H2SO4 optimum concentration is 0.4mol/L更多还原