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A Study of Diamond-Like Carbon Thin Films Prepared by Microwave Plasma Chemical Vapour Deposition

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【作者】 赖秀琼陈俊芳符斯列李炜张茂平史磊杨春林

【Author】 LAI Xiuqiong CHEN Junfang FU Silie LI Wei ZHANG Maoping SHI Lei YANG Chunlin School of Physics and Telecommunication Engineering,South China Normal University Guangdong 510631,China

【机构】 School of Physics and Telecommunication Engineering,South China Normal University Guangdong 510631,China

【摘要】 <正> In order to deposit good films,we need to study the uniformity of plasma density andthe plasma density under different gas pressures and powers.The plasma density was diagnosedby a Langmuir probe.The optical emission spectroscopy(OES)of CH4 and H2 discharge wasobtained with raster spectroscopy,with characteristic peaks of H and CH achieved.Diamond-likecarbon films were achieved based on the study of plasma density and OES and characterized byatomic force microscope(AFM),X-ray diffraction instrument(XRD),Raman spectroscope andprofiler.

【Abstract】 In order to deposit good films,we need to study the uniformity of plasma density and the plasma density under different gas pressures and powers.The plasma density was diagnosed by a Langmuir probe.The optical emission spectroscopy(OES)of CH4 and H2 discharge was obtained with raster spectroscopy,with characteristic peaks of H and CH achieved.Diamond-like carbon films were achieved based on the study of plasma density and OES and characterized by atomic force microscope(AFM),X-ray diffraction instrument(XRD),Raman spectroscope and profiler.

  • 【文献出处】 Plasma Science and Technology ,等离子体科学和技术(英文版) , 编辑部邮箱 ,2007年04期
  • 【分类号】O433
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