【摘要】 比较空心微球表面化学镀Ni薄膜的工艺。分别以Sn-Pd胶体溶液和[Ag(NH3)2]+溶液作为活化剂,将空心微球表面进行活化,再采用化学镀的方法分别在其上淀积金属Ni薄膜。使用扫描电子显微镜(SEM)、能量色散光谱(EDS)和X-射线衍射光谱(XRD)对两种工艺所镀Ni薄膜的表面微观结构和组分进行表征。结果表明:用Sn-Pd胶体溶液活化后的空心微球表面淀积了均匀、致密的金属Ni薄膜,该薄膜是由大小约100nm的颗粒组成;而以[Ag(NH3)2]+溶液活化后的空心微球表面淀积的金属Ni薄膜,是由大小约1μm的颗粒组成。并分析了这两种镀层形成的机理。更多还原

【Abstract】 It was compared that the processing of electroless Ni thin film on the hollow microspheres.Electroless Ni thin film was carried out on microspheres by using Sn-Pd colloidal solution and [Ag(NH3)2]+ solution as activator,respectively.The hollow microsphere particles were characterized by scanning electron microscope(SEM),energy dispersive spectroscopy(EDS),X-ray diffraction analysis(XRD) after coating processing.Results show that the continuous and uniform Ni coating is deposited on the hollow microspheres activated by Sn-Pd colloidal solution,which is composed of the particles of 100nm size.But the Ni thin film coated on the hollow microspheres activated by a [Ag(NH3)2]+ solution is composed of the particles of 1μm size.The formation mechanism is discussed for electroless Ni thin film on the hollow microspheres by using Sn-Pd colloidal solution and a [Ag(NH3)2]+ solution as activator,respectively.更多还原