【摘要】 以铜片为衬底,用硝酸锌水溶液为电解液,采用阴极恒电流还原制备氧化锌薄膜。通过改变电流密度、电解液浓度、温度、离子掺杂等实验条件,系统研究了锌氧化物薄膜材料的电化学沉积过程。用X射线衍射、紫外-可见透射谱、热重-差热等技术对沉积物的结构、组成及光学性质进行了表征,结果表明,电沉积工艺条件显著影响薄膜材料的结构与组成。当电沉积产物中掺杂铜时,薄膜材料的光吸收边从375nm红移到458nm,带隙能从3.3eV降到2.7eV,拓宽了薄膜的吸光范围,这对ZnO薄膜在光学方面的应用具有重要意义。更多还原

【Abstract】 ZnO thin film is galvanostatically electrodeposited from an aqueous solution of Zn(NO3)2 on Cu substrate which is cathode.The electrodeposition process of ZnO thin film is systematically studied when changing deposition conditions such as current density,electrolyte concentration,temperature and ion doping,etc.The structure,composition and optical property of deposits are characterized by X-ray diffraction(XRD),UV-Vis transmission spectra and thermal gravimetric-differential thermal analysis(TG-DTA).The results indicate that the structure and composition of the films are related with deposition conditions.The absorption edge of ZnO increase from 375nm to 458nm and the bandgap energy decreases from 3.3eV to 2.7eV when doping with Cu2+.The light absorption range of thin films becomes larger.This is important for ZnO thin film about its optical application.更多还原