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微颗粒表面磁控溅射镀金属膜
Preparation and Characterization of Metal-coated Micro-particles by Magnetron Sputtering
【摘要】 采用磁控溅射方法,开展了在微颗粒表面镀金属膜的实验研究.研究开发了一种在微颗粒表面真空镀金属膜的方法及设备,微颗粒包括空心微珠、不同粒度的碳化硅微粉等,所镀的金属包括铝、银、铜、钴、镍等.实验与分析结果表明,通过控制微颗粒的运动方式,采用磁控溅射镀金属膜,可以在微颗粒表面镀上均匀性好、附着力强和致密性好的金属膜.
【Abstract】 Metal films coated on micro-particles were studied by magnetron sputtering method.A set of new magnetron sputtering equipment was designed and used to coat metals such as aluminum,silver,copper,cobalt and nickel on the surface of micro-particles.The micro-particles include cenosphere particles and SiC particles.The surface morphology,composition,grain size and crystallinity of the particles were characterized by optical microscopy(OM),field emission scanning electron microscopy(FE-SEM) and X-ray diffraction(XRD) analysis respectively before and after the plating process.The results indicate that the relatively uniform,adhesive and compact metal films are successfully deposited on cenosphere particles by magnetron sputtering in micrometer length scales.
【Key words】 micro-particle; magnetron sputtering; metal film; surface morphology;
- 【文献出处】 过程工程学报 ,The Chinese Journal of Process Engineering , 编辑部邮箱 ,2006年S2期
- 【分类号】O484.1
- 【被引频次】8
- 【下载频次】295