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Surface Roughness of Various Diamond-Like Carbon Films

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【作者】 刘东平刘艳红陈宝祥

【Author】 LIU Dongping LIU Yanhong CHEN Baoxiang School of Mathematics and Physics,Dalian Nationalities University,Dalian 116600,China State Key Laboratory for Material Modification by Laser,Ion and Electron Beams,Dalian University of Technology,Dalian 116024,China

【机构】 School of Mathematics and Physics,Dalian Nationalities University,Dalian 116600,ChinaState Key Laboratory for Material Modification by Laser,Ion and Electron Beams,Dalian University of Technology,Dalian 116024,China

【摘要】 <正> Atomic force microscopy is used to estimate and compare the surface morphologyof hydrogenated and hydrogen-free diamond-like carbon (DLC) films.The films were preparedby using DC magnetron sputtering of a graphite target,pulsed cathodic carbon arcs,electron cy-clotron resonance (ECR),plasma source ion implantation and dielectric barrier discharge (DBD).The difference in the surface structure is presented for each method of deposition.The influ-ences of various discharge parameters on the film surface properties are discussed based uponthe experimental results.The coalescence process via the diffusion of adsorbed carbon speciesis responsible for the formation of hydrogen-free DLC films with rough surfaces.The films withsurface roughness at an atomic level can be deposited by energetic ion impacts in a highly ionizedcarbon plasma.The dangling bonds created by atomic hydrogen lead to the uniform growth ofhydrocarbon species at the a-C:H film surfaces of the ECR or DBD plasmas.

【Abstract】 Atomic force microscopy is used to estimate and compare the surface morphology of hydrogenated and hydrogen-free diamond-like carbon (DLC) films.The films were prepared by using DC magnetron sputtering of a graphite target,pulsed cathodic carbon arcs,electron cy- clotron resonance (ECR),plasma source ion implantation and dielectric barrier discharge (DBD). The difference in the surface structure is presented for each method of deposition.The influ- ences of various discharge parameters on the film surface properties are discussed based upon the experimental results.The coalescence process via the diffusion of adsorbed carbon species is responsible for the formation of hydrogen-free DLC films with rough surfaces.The films with surface roughness at an atomic level can be deposited by energetic ion impacts in a highly ionized carbon plasma.The dangling bonds created by atomic hydrogen lead to the uniform growth of hydrocarbon species at the a-C:H film surfaces of the ECR or DBD plasmas.

【基金】 supported by National Natural Science Foundation of China(No.10405005)
  • 【文献出处】 Plasma Science and Technology ,等离子体科学和技术(英文版) , 编辑部邮箱 ,2006年06期
  • 【分类号】O484
  • 【被引频次】5
  • 【下载频次】8
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