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Structure and Tribology Property of Carbon Nitride Films Deposited by MW-ECR Plasma Enhanced Unbalanced Magnetron Sputtering

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【Author】 GAO Peng~1 XU Jun~1 PIAO Yong~1 DING Wanyu~1 DENG Xinlu~1 DONG Chuang~(1,2)1 State Key Laboratory of Materials Modification by Laser,Ion and Electron Beams,Dalian University of Technology,Dalian 116024,China2 International Centre for Materials Physics,Chinese Academy of Sciences,Shenyang 110016,China

【机构】 State Key Laboratory of Materials Modification by Laser,Ion and Electron Beams,Dalian University of Technology,Dalian 116024,China； State Key Laboratory of Materials Modification by Laser,Ion and Electron Beams,Dalian University of Technology,Dalian 116024,China International Centre for Materials Physics,Chinese Academy of Sciences,Shenyang 110016,China；

【摘要】 <正> Carbon nitride films were deposited by a twinned microwave electron cyclotronresonance (ECR) plasma source enhanced unbalanced magnetron sputtering system.The resultsindicate that the structure of the films is sensitive to the nitrogen content.The increase in thenitrogen flow ratio leads to an increase in the sp3 content and an improvement of the tribologicalproperties.更多还原

【Abstract】 Carbon nitride films were deposited by a twinned microwave electron cyclotron resonance (ECR) plasma source enhanced unbalanced magnetron sputtering system.The results indicate that the structure of the films is sensitive to the nitrogen content.The increase in the nitrogen flow ratio leads to an increase in the sp3 content and an improvement of the tribological properties.更多还原

【关键词】 carbon nitride； tribological property； unbalanced magnetron sputtering；
【Key words】 carbon nitride； tribological property； unbalanced magnetron sputtering；

【基金】 supported by National Natural Science Foundation of China (No.50390060)

【文献出处】 Plasma Science and Technology ,等离子体科学和技术(英文版) , 编辑部邮箱 ,2006年04期

【分类号】O484;O539
【下载频次】3

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