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脉冲阴极电沉积羟基磷灰石涂层

Pulsed cathode electrodeposition of hydroxyapatite coatings

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【作者】 赵中伟陈爱良陈星宇孙培梅李洪桂

【Author】 ZHAO Zhong-wei~1,CHEN Ai-liang~1,CHEN Xing-yu~1,SUN Pei-mei~2, LI Hong-gui~1(1.School of Metallurgical Science and Engineering,Central South University,Changsha 410083,China;2.School of Metallurgical and Environmental Engineering,China University of Mining and Technology,Beijing 100083,China)

【机构】 中南大学冶金科学与工程学院中国矿业大学化学环境工程学院中南大学冶金科学与工程学院 长沙410083长沙410083北京100083

【摘要】 对脉冲阴极电沉积与恒电位阴极电沉积制备的羟基磷灰石涂层膜进行了对比实验。结果表明:由于脉冲电沉积的一个关断时间使离子得以从溶液本体向电极表面扩散,在下一脉冲来临时浓差极化的减小有利于HAP的生长;在一定的导通时间下,关断时间的延长有利于羟基磷灰石的沉积,但时间的过度延长不利于羟基磷灰石的沉积;当通电时间为5 s时,其最佳关断时间为2 s;沉积时阴极极化的增强虽有利于膜的生长,但极化过于强烈(阴极电位为-1.0 V(vs SCE)时,涂层易脱落。

【Abstract】 Pulsed cathode electrodeposition was compared with potentiostatic one to prepare hydroxyapatite coatings.The results of pulsed electrodeposition show that there exists a relaxation time which is beneficial to the growth of HAP,due to it enables ions diffuse from bulk to the surface of electrode and reduce concentration polarization in the next pulse time.The increasing pulsed time is also beneficial to the deposition of HAP,but the result is not good if it increases excessively.HAP coatings are easy to drop off in electrodeposition under too intensive polarization,such as at cathode potential of(-1.0V)(vs SCE),although it is good for the growth of HAP.

【基金】 国家自然科学基金资助项目(50104012)
  • 【文献出处】 中国有色金属学报 ,The Chinese Journal of Nonferrous Metals , 编辑部邮箱 ,2005年12期
  • 【分类号】R318.08
  • 【被引频次】16
  • 【下载频次】250
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