PbTiO3 thin films have been deposited on Si(111) and Pt/Ti/Si(111) by electrostatic spray deposition.The effect of substrate temperature and deposition time on the structure and morphologies of the films were studied.Both porous and dense PbTiO3 thin films were prepared by modification of the deposition sequence.The dielectric properties of the PbTiO3 thin films were measured.The dielectric constant and the dissipation factor of the PbTiO3 film at 100 kHz were 222 and 0.0247,respectively.
【更新日期】
2005-12-24
【分类号】
TM221;
【正文快照】
1前言PbTiO 3薄膜是典型的钙钛矿型铁电材料,具有大的自发极化和小的介电常数,应用于动态随机存储器(D RA M)、红外热释电探测器以及传感器等[1]。目前,制备PbTiO 3薄膜的方法有溅射[2]、溶胶-凝胶(Sol-G el)[3]、水热法[4]、金属有机物化学气相沉积(M O CV D)[5]以及喷雾热解?
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