节点文献
离子溅射用高频PWM电源及其控制系统的设计
PWM high-frequency power supply for ion sputtering and its design of control system
【摘要】 介绍了一种用于真空镀膜的等离子溅射高频PWM电源,并对其硬件电路包括主电路和控制电路的设计、软件程序开发及电源设计中的系统抗干扰等问题进行了阐述。
【Abstract】 Introduces a high-frequency PWM power supply used for vacuum ion sputtering film deposition. The design of its hardware circuit including main circuit and control circuit, development of software and solution to the problem of interference in the system are all presented.
- 【文献出处】 真空 ,Vacuum , 编辑部邮箱 ,2005年04期
- 【分类号】TB43
- 【被引频次】2
- 【下载频次】132