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电子束蒸镀制备的Mg-Zr-O复合介质保护膜结晶取向的研究
Preferred Crystal Orientation of Mg-Zr-O Composite Protective Layer Prepared by E-beam Evaporation
【摘要】 采用电子束蒸发制备Mg Zr O复合介质保护膜 ,使用X射线衍射测试Mg Zr O复合介质保护膜的结晶择优取向 ,研究了ZrO2 掺杂及工艺参数对Mg Zr O复合介质保护膜结晶取向的影响。结果表明 ,ZrO2 掺杂会使Mg Zr O复合介质保护膜产生晶格畸变 ,并改变其结晶取向。当ZrO2 掺杂比为 0和 0 .10时 ,晶格畸变较小 ,容易获得 (111)结晶取向 ;当ZrO2 掺杂比为0 .0 5和 0 .2 0时 ,晶格畸变较大 ,容易获得 (2 2 0 )或 (2 0 0 )结晶取向。蒸镀工艺对 (111)、(2 0 0 )和 (2 2 0 )取向的影响不尽相同 :较高的蒸镀速率有利于获得较强的 (111)、(2 0 0 )和 (2 2 0 )衍射峰 ;较低的基板温度有利于获得 (111)和 (2 2 0 )结晶取向 ,而较高的基板温度则有利于获得 (2 0 0 )结晶取向。
【Abstract】 Mg-Zr-O composite protective film was grown on glass substrate of an AC plasma display panel (AC-PDP) by electron beam deposition of MgO powders mixed with different contents of ZrO 2.The structures of the film was then characterized with X-ray diffraction (XRD).The results show that addition of ZrO 2 significantly affects the grain orientation and lattice distortion of the film.When the ZrO 2 contents by weight account for 0.00 and 0.10 of the mixed powders,small lattice distortion and preferred 〈111〉 growth orientation were observed,whereas the contents of ZrO 2 increase to 0.05 and 0.20,fairly large lattice distortion was found and the grains easily grow preferably in 〈200〉 and 〈220〉 orientations.Moreover,strong (111),(200) and (220) diffraction peaks result from higher deposition rates.The preferred orientations of low substrate temperature are 〈111〉 and 〈220〉,while it becomes 〈200〉direction for higher substrate temperatures.
【Key words】 Plasma display panel (PDP); Protective layer; ZrO 2; Preferred crystal orientation;
- 【文献出处】 真空科学与技术学报 ,Chinese Journal of Vacuum Science and Technology , 编辑部邮箱 ,2005年01期
- 【分类号】TN105
- 【被引频次】4
- 【下载频次】136