节点文献
PDP中ITO膜制作工艺技术的研究
Etching Research of ITO Films in PDP
【摘要】 概述了ITO的特性和它在PDP显示中所起的作用。通过大量实验摸索了一套适合实验室制作刻蚀ITO膜的工 艺,其中包括涂胶、擦边、曝光、显影、刻蚀等。
【Abstract】 The characteristics of ITO films and its performance in PDP are illustrated.The etching technologies of ITO films suitable for laboratory operation, including gelatinization, border scouring, exposal, development, etching and so on ,are obtained after a series of experiments.
- 【文献出处】 真空电子技术 ,Vacuum Electronics , 编辑部邮箱 ,2005年06期
- 【分类号】TN105
- 【被引频次】5
- 【下载频次】200