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退火处理对ITO表面特性及有机发光器件性能的影响

Influence of Annealing Treatment on ITO Surface and OLED Performances

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【作者】 仲飞刘彭义段光凤

【Author】 ZHONG Fei, LIU Peng-yi, DUAN Guang-feng(Department of Physics, Jinan University, Guangzhou 510632, China)

【机构】 暨南大学物理系暨南大学物理系 广东广州510632广东广州510632

【摘要】 为了改善有机发光器件(OLEDs)的性能,在0~600℃不同温度下对ITO透明导电玻璃进行了退火处理。SEM观察到随退火温度的升高,ITO表面粗糙度增加;四探针电阻测试结果显示,在300℃以上温度退火后ITO表面电阻率有明显增加。用退火前后的ITO玻璃作为阳极制备了OLEDs,器件结构为ITO/TPD/Alq3/Al,比较器件的电流密度-电压特性曲线测试结果表明,ITO薄膜的热处理温度对OLEDs性能有显著的影响。

【Abstract】 The characteristics of indium tin oxide (ITO) films deposited on glass substrates were investigated by thermal annealing at different temperature in the range from 0 ℃ to 600 ℃ to improve their quality for use in organic light-emitting diodes (OLEDs). The morphology of the ITO films surface was significantly changed by the treatment as observed by scanning electron microscopy (SEM). At higher temperatures (>300 ℃), the shift resistance obviously increases with increasing of annealing temperature. The electrical and optical characteristics of OLEDs with the structure of ITO/TPD/Alq3/Al, prepared on pre-treated and untreated ITO substrates, were determined and compared. The results show that the performances of OLEDs are influenced remarkably by ITO substrates annealed at different temperature.

【关键词】 ITO有机发光器件退火表面处理性能
【Key words】 ITOOLEDannealingsurface treatmentperformances
【基金】 广东省自然科学基金资助项目(No.021169)
  • 【文献出处】 液晶与显示 ,Chinese Journal of Liquid Crystals and Displays , 编辑部邮箱 ,2005年06期
  • 【分类号】TN312.8
  • 【被引频次】13
  • 【下载频次】513
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