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(LaxBi1-x)2Ti2O7薄膜X射线光电子能谱研究
X-ray Photoelectron Spectroscopy Study of (LaxBi1-x)2Ti2O7 Thin Film
【摘要】 采用化学溶液沉积(CSD)工艺在Si(100)衬底上制备了Bi2Ti2O7(BTO(和(LaxBi1-x)2Ti2O7(BLT(铁电薄膜,薄膜的X射线衍射(XRD)结果显示其具有较好的结晶性,运用X射线光电能谱仪(XPS)对薄膜的结构进行了研究,分析结果表明,薄膜中氧空位的出现影响了其相的稳定性,通过掺La可以改善其性能。
【Abstract】 (LaxBi1-x)2Ti2O7(BLT)and Bi2Ti2O7(BTO)films were prepared on Si(100) substrates by chemical solution deposition(CSD).The result of X-ray diffraction (XRD)patterns show the films with good orientation. X-ray photoelectron Spectroscopy (XPS) measurements were executed to compare the nature of defects in those films. It was found that phase stability of thin film is affected by oxygen vacancies after substituting Bi atoms with some La atoms the quality of BLT thin films is improved.
- 【文献出处】 压电与声光 ,Piezoelectrics & Acoustooptics , 编辑部邮箱 ,2005年01期
- 【分类号】TN202
- 【下载频次】104