【摘要】 得到移动光源照射下平板温度分布的理论解,验证了有限元方法的正确性。建立了X射线掩模电子束制备图形过程中传热的三维有限元模型,给出了掩模瞬态温度变化规律。结果表明,辐射是X射线掩模在图形制备中必须考虑的重要因素之一,当不考虑辐射时,掩模瞬时最高温度随时间振荡升高,最高温度为35.20℃;当考虑辐射时,掩模瞬时最高温度随时间周期变化,最高温度为26.95℃。更多还原

【Abstract】 Theory solution of plane temperature distribution was obtained under moving beam ex- posure and the finite element method was verified·Developing three-dimensional finite element model of X-ray mask during electron-beam patterning (EBP), transient temperature variation was given·The results show that radiation is one of the most important factors for X-ray mask during EBP·Taking no account of the radiation, the transient maximum temperature fluctuates and in-更多还原