【摘要】 声空化所引发的特殊的物理、化学环境为制备高效发光的多孔硅薄膜提供了一条重要的途径 .实验结果表明 ,声化学处理对于改善多孔硅的微结构 ,提高发光效率和发光稳定性都是一项非常有效的技术 .超声波加强阳极电化学腐蚀制备发光多孔硅薄膜 ,比目前通用的常规方法制备的样品显示出更优良的性质 .这种超声的化学效应源于声空化 ,即腐蚀液中气泡的形成、生长和急剧崩溃 ,在多孔硅的腐蚀过程中 ,孔中的氢气泡 ,由于超声波的作用增加了逸出比率和塌缩 ,有利于孔沿垂直方向的腐蚀 .更多还原

【Abstract】 The special physicochemical environment caused by sonic-vacating provides an important outlet for the preparation of highly efficient luminescent porous silicon films.Experimental results show that sonic-chemical treatment is an effective technology for the improvement of the microstructure of porous silicon,and the luminescent efficiency and stability thereof.Luminescent porous silicon films,prepared by ultrasonic-enhanced anode electrochemical etching,display better qualities than the samples prepared by conventionai methods widely used at present.This ultrasonic-chemical effect roots in sonic-vacating,i.e. the generation,formation and rapid collapse of bubbles in the etching solution.In the process of the porous silicon being etched,the escape rate and caving-in of hydrogen bubbles in the pores is increased as a result of the work of the ultrasonic waves,which is helpful to the vertical etching of the pores.更多还原