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二氧化钛薄膜的低温制备及其性能表征
Preparation of TiO2 Thin Films at Low Temperature and Characterization of Their Properties
【摘要】 通过水煮法在较低温度下制备了均匀、透明的 TiO2-SiO2复合薄膜,利用 XRD、AFM 和 UV-Vis 光谱等手段对薄膜的物相、表面形态结构和透明性进行了表征,分析了 SiO2的添加对薄膜性质的影响,并利用紫外光照降解罗丹明 B 溶液评价了薄膜的光催化活性及其影响因素,实验结果表明,通过水煮法在较低温度下制备的薄膜具有较高的光催化活性,适量 SiO2的添加能够提高薄膜的光催化活性。
【Abstract】 TiO2 and TiO2-SiO2 thin films were prepared at low-temperature with hot water treatment.Theircrystal structure,surface morphology and transparency were characterized by XRD,AFM and UV-Vis spectrarespectively,and the effects of addition of SiO2 in the films on their performances after treatment with hot waterwere analyzed.The evaluations of photocatalytic activities of thin films were carded out by degradation of rho-damine B in water solution under UV irradiation.The results showed that the thin films prepared at low tem-perature with hot water treatment have high reactivitity for degradation of rhodamine B and the addition of SiO2can significantly increase the photocatalytic reactivitity.
【Key words】 Hot water treatment; TiO2 thin films; AFM; Low temperature; Photocatalysis;
- 【文献出处】 物理化学学报 ,Acta Physico-chimica Sinica , 编辑部邮箱 ,2005年01期
- 【分类号】O643.3
- 【被引频次】39
- 【下载频次】702