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离子层气相反应法(ILGAR)制备CuInS2薄膜的研究

Study on CuInS2 Thin Films Grown by Ion Layer Gas Reaction (ILGAR) Me thod

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【作者】 邱继军靳正国钱进文石勇武卫兵

【Author】 QIU Ji-Jun JIN Zheng-Guo* QIAN Jin-Wen SHI Yong WU Wei-Bing(Key Laboratory For Advanced Ceramics and Machining Technology of Ministry of Ed ucation,School of Materials, Tianjin University, Tianjin 300072)

【机构】 天津大学材料学院先进陶瓷与加工技术教育部重点实验室天津大学材料学院先进陶瓷与加工技术教育部重点实验室 天津300072天津300072天津300072

【Abstract】 CuInS2 thin films have been prepared by ion layer gas reaction (ILGAR) using C2H5OH as solvent, CuCl and InCl3 as reagents and H2S gas as sulfuration source. The effects of cationic concentrations and numbers of cycle on the prope rties of CuInS2 film were investigated. The chemical composition, crystalline st ructure, surface topography, deposited rate, optical and electronic properties o f the films were characterized by X-ray diffractrometry (XRD), X-ray photoelectr on spectroscopy (XPS), scanning electron microscopy (SEM), ultraviolet-visible s pectrometry (UV-Vis) and Hall System. The results show that the crystalline of C uInS2 thin films and the deposition rate have been improved with the increase of cationic concentration, while CuxS segregation phases appear with further incre asing cationic concentration. The deposition rate is close to constant as cation ic concentration is fixed. CuInS2 thin film derived form lower cationic concentr ation is uniform, compact and good in adhesion to the substrates. The absorption coefficient of CuInS2 thin films is larger than 104 cm-1, and the band gap Eg i s in the range of 1.30~1.40 eV. The dark resisitivity of the thin film decreases from 50 to 10 Ω·cm and the carrier concentration ranges are over 1016 cm-3.

【关键词】 CuInS2薄膜ILGAR法C2H5OH溶剂
【Key words】 CuInS2 thin filmsILGAR methodsC2H5OH solvent
【基金】 天津市重点基础研究项目(No.F103004)资助
  • 【文献出处】 无机化学学报 ,Chinese Journal of Inorganic Chemistry , 编辑部邮箱 ,2005年03期
  • 【分类号】TM914
  • 【被引频次】9
  • 【下载频次】195
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