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非平衡磁控溅射离子镀MoS2-Ti复合薄膜的结构及性能
Structure and properties of MoS2-Ti composite films deposited by unbalanced magnetron sputter ion plating
【摘要】 用非平衡磁控溅射离子镀法沉积了钛含量不同的MoS2-Ti复合薄膜,电子探针分析表明共沉积钛可以降低MoS2薄膜中氧杂质的含量,XRD分析显示薄膜具有类似非晶的结构.划痕试验结果显示薄膜的临界载荷都大于100 N,球盘磨损试验结果显示MoS-Ti复合薄膜比MoS薄膜耐磨性好,并且摩擦系数低于0.07.
【Abstract】 MoS2-Ti composite films with different titanium concentrations are deposited by unbalanced magnetron sputter ion plating.Electron probe microanalysis(EPMA) shows that the oxygen content of the MoS2 films can be decreased by co-depositing titanium.XRD indicates that the films are quasi-amorphous structure.The scratch tests show that the films undergo no failure up to a load of 100 N.The pin-on-disc tests indicate that the MoS2-Ti composite films are more wear resistant than MoS2 film and retain low friction coefficients(under 0.07).
【基金】 山东省科学技术发展计划项目(032110102)
- 【文献出处】 山东大学学报(工学版) ,Journal of Shandong University (Engineering Science) , 编辑部邮箱 ,2005年06期
- 【分类号】TG174.44
- 【被引频次】4
- 【下载频次】196