【摘要】 用射频磁控溅射在Pt/Ti/Si O2/Si基体上,沉积了Ba0.6Sr0.4Ti O3(BST)薄膜,随后对其进行常规晶化和快速晶化,用XPS,GXRD和AFM研究了薄膜表层的结构特征.XPS表明,常规晶化的BST薄膜表层约3nm～5nm厚度内含有非钙钛矿结构的BST,随着温度的升高该厚度增加;而快速晶化时,该厚度减薄至1nm内,随着温度的升高没有明显增厚.元素的化学态表明非钙钛矿结构的BST并非来自薄膜表面吸附的含碳污染物(如CO2等),而与吸附的其他元素(如吸附氧等)对表层的影响有关.GXRD和AFM表明,致密的表面结构能有效地阻止吸附元素在BST膜体中的扩散,从而减薄含非钙钛矿结构层的厚度.更多还原

【Abstract】 Ba 0.6 Sr 0.4 TiO₃ （BST） thin films were deposited on Pt/Ti/SiO₂/Si substrates by radio frequency magnetron sputtering. The deposited BST films were crystallized with conventional thermal annealing （CTA） and rapid thermal annealing （RTA）. X-ray photoelectron spectroscopy （XPS） experiments show that for the CTA annealed BST films much non-perovskited BST phase is observed in the surface layer and its distributing depth is 3～5nm and increased with the increase of annealing temperature, while for the RTA annealed BST films little non-perovskited BST phase is observed and its distributing depth is reduced to less than 1nm and shown not obvious change. XPS also shows that the non-perovskited BST phase doesn’t come from the surface absorbed contaminations such as CO₂, but from the other absorbed elements such as oxygen. GXRD and AFM display that RTA shows more compact surface structure than CTA, thus the corresponding surface can more effectively prevent the absorbed elements from diffusing into the BST film further, resulting in smaller distributing depth of non-perovskited BST phase.更多还原