【摘要】 采用等离子辅助热丝化学气相沉积(PAHFCVD)装置进行了金刚石薄膜、碳化钛/金刚石复合膜、掺硼金刚石薄膜的制备。制备条件分别为:V(CH)4∶V(H2)=3∶100,载气流量5~50 cm3.s─1,钛源钛酸异丙酯(Ti[OC3H7]4),硼源硼酸三甲酯(BC3O4H9),基体温度820~860℃,基体偏压300 V,沉积气压4 kPa。运用扫描电子显微镜(SEM)、X射线衍射(XRD)和能量扩散电子谱(EDX)等分析手段对PAHFCVD金刚石膜、金刚石复合膜和掺硼金刚石膜进行了表征。结果发现,金刚石/碳化钛膜和掺硼金刚石膜主要晶面为(111)面。更多还原

【Abstract】 Diamond,diamond/TiC composite and boron doped diamond films were deposited by plasma assistant hot-filament chemical vapor deposition（PAHFCVD）.The H₂ flow rate was 200 cm³·s^-1,the ratio of CH₄to H₂ was 3∶100;the carrying gas flow rate was 5⁵0 cm³·s^-1,Ti[OC₃H₇]₄ and BC₃O₄H₉ were used as titanium and boron resources,respectively,the deposition temperature was 820⁸60 ℃,the bias voltage of the sample was 300 V and the deposition pressure was 4 kPa.SEM,XRD and EDX were carried out to investigate the surface characteristics of the films.We found that the crystallites of diamond/TiC and boron doped diamond films grew mainly along the \ axis.更多还原