【摘要】 用分子动力学的方法,在计算机上模拟了在具有不同偏斜度Sk的衬底上薄膜的成核过程,从理论上证明了偏斜度Sk取值在-1～-3时,薄膜的成核率高,从而有利于薄膜的生长。更多还原

【Abstract】 The Nucleus circumstance of the coating on the substrate with different skewness of the profile (Sk) has been simulated by molecular dynamics method. It is proved that when the Sk is from -1 to -3, the Nucleus of thin films is higher.更多还原