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硅基场发射阴极材料研究进展
Research Progress on Silicon-based Field Emission Cathode Materials
【摘要】 场发射显示技术在原理上具有多种优越性能,可能在未来平板显示技术中居主导地位。硅基场发射阴极易于与其周边驱动电路实现集成,因而更具有明显的开发前景。在综述硅基场发射阴极材料最新研究进展的基础上,就其所面临的问题、可能的解决方案和未来的发展趋势做出了评述。
【Abstract】 Due to its many-sided, principle-originated preeminent natures, the field emission technique probably predominates over the field of flat panel display in the future. Among all of the field emission cathodes, the silicon-based field emission cathode has been hoped much because of its easily-realized integration with the surrounding drive circuits. Based on summarizing the recent progress of silicon-based field emission cathode materials, a review on the facing problems, the possible solutions, and the development tendency in the future are presented.
【关键词】 硅基场致发射阴极材料;
硅尖锥形阴极阵列;
场发射;
【Key words】 silicon-based field emission cathode materials silicon-based tip-cathode array field emission;
【Key words】 silicon-based field emission cathode materials silicon-based tip-cathode array field emission;
【基金】 河南省自然科学基金(411011800)教育部骨干教师基金资助
- 【文献出处】 科学技术与工程 ,Science Technology and Engineer , 编辑部邮箱 ,2005年03期
- 【分类号】TN104
- 【被引频次】18
- 【下载频次】259