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直流弧光放电等离子体CVD金刚石薄膜中的晶体类型与特征
CRYSTAL MORPHOLOGY AND FEATURE OF THE DIAMOND FILMS BY DC ARC DISCHARGE
【摘要】 采用自主研制的直流弧光放电等离子体CVD设备,以甲烷和氢气为气源,在YG 6硬质合金基体上制备出主显晶面为(100)、(111)以及纳米晶粒的金刚石薄膜涂层。SEM观测其晶体类型主要为立方体、八面体、立方八面体,其中以立方八面体为主。随着碳源气体浓度的增加,金刚石晶体的形态会呈现从八面体-立方八面体-立方体顺序转变的趋势;而薄膜的表面形貌呈现从主显(111)晶面-(111)与(100)晶面混杂-主显(100)晶面顺序转变的特征。此外,CVD金刚石薄膜中还存在有许多类似接触孪晶、贯穿孪晶、复合孪晶,以及球形或聚晶晶粒形态的晶体,并且多数孪晶属于类似{111}复合孪晶结构。
【Abstract】 Polycrystalline diamond films with surface morphology of {100} and {111} facets were synthesized on a abraded cemented carbide tungsten tool from a gas mixture of methane and hydrogen by DC arc discharge plasma CVD.The morphology of diamond film observed by SEM.Showed that with increasing carbon gas concentration,the film morphology changed from {111} to {100} and the diamond particle shape varied from octahedron to cubic.There also exist a lot of twin-like particles and ballas type particles in the diamond films.
【Key words】 diamond; diamond film; DC arc discharge plasma chemical vapor deposition; tungsten carbide; crystalline morphology;
- 【文献出处】 矿物岩石 ,Journal of Mineralogy and Petrology , 编辑部邮箱 ,2005年03期
- 【分类号】TB43;
- 【被引频次】6
- 【下载频次】214