【摘要】 采用高功率直流电弧等离子体CVD工艺制备了不同厚度的无裂纹自支撑金刚石厚膜.实验中观察到在金刚石厚膜生长过程中出现了形貌不稳定性,其程度随甲烷浓度的不同而变化.从理论和实验两个方面对这种不稳定性进行了讨论,认为直流电弧等离子体的高温造成碳源高饱和度是生长不稳定性的根本原因.实验结果表明,在沉积金刚石厚膜时,为了稳定地获得高质量的厚膜,甲烷浓度不宜过高.更多还原

【Abstract】 Diamond film wafers with different thickness were prepared by high power DC arc plasma jet CVD method. The diamond film growth was unstable at some methane concentrations and the instability degree depends on the methane concentration. Theoretical analysis and experimental investigation show that the instability is mainly attributed to the high super saturation of carbon concentration due to the high temperature arc jet. Based on the experimental observations, it is suggested that in order to realize stable growth of high-quality thick diamond film, the methane concentrations should be controlled at a low level.更多还原