【摘要】 用脉冲直流等离子体增强化学气相沉积(PCVD)方法,在高速钢试样表面沉积出一种新型Ti-Si-C-N薄膜材料.研究了不同SICl4流量对薄膜成分、微观组织形貌以及薄膜晶体结构的影响.X射线衍射(XRD)、X射线光电子能谱(XPS)、透射电子显微镜(TEM)和扫描电子显微镜(SEM)分析结果表明:Ti-Si-C-N薄膜是由Ti(C,N)/a-C/a-SiaN4组成的纳米复合结构,薄膜的晶粒尺寸在2-25nm范围内;当Ti-Si-C-N薄膜中N含量很少时,Ti(C,N)结构转变为TiC,薄膜的表面形貌由颗粒状转变为粗条状.更多还原

【Abstract】 Using an industrial pulsed DC plasma chemical vapor deposition set-up, Ti-Si-C-N coatings were deposited on substrate of high speed steel. The effect of SiCl4 flow rate on chemical composition, microstructure and phases in Ti-Si-C-N coatings was explored by means of XRD, XPS, TEM and SEM. It is suggested that Ti-Si-C-N coatings are of nanocomposite structure composed of nc-Ti(C, N)/a-C/a-Si3N4. The crystalline sizes are in the range of 2-25 nm. When nitrogen content in the coatings was very low, Ti(C, N) changed to TiC and the surface morphologies of Ti-Si-C-N coatings changed from granular grains to strip-shaped grains.更多还原