【摘要】 为了研究自离子轰击对纯锆耐蚀性的影响,用MEVVA源对纯锫样品进行了1×1015至2×1017ions/cm2的自离子轰击,注入温度为170℃,加速电压为50 kV.用X射线光电子谱(XPS)对注入表面各元素进行价态分析;用Auger电子能谱(AES)分析氧化膜厚度.三次极化测量用来评价轰击样品在1 mol/L H2SO4溶液中的耐蚀性.用掠射X射线衍射(GAXRD)分析自离子轰击造成的氧化膜相转变.研究表明: 5×1016 Zr ions/cm2自离子轰击样品的耐蚀性最好.对自离子轰击纯锆的腐蚀行为机理进行了讨论.更多还原

【Abstract】 In order to investigate the affect of self-ion bombardment on the aqueous corrosion behavior of zirconium, the specimens were implanted by zirconium ions with a fluence range from 1×1015 to 2×1017 ions/cm2 at about 170 ℃, using a MEVVA source at an extractation voltage of 50 kV. The valence of the surface layer was analyzed by X-ray photoemission spectroscopy (XPS); the thickness of the oxide film was measured by Auger electron spectroscopy (AES). Three-sweep poten-tiodynamic polarization measurement was used to value the aqueous corrosion resistance of implanted zirconium in 1 mol/L H2SO4 solution. Glancing angle X-ray diffraction (GAXRD) was employed to determine the phase transformation due to the self-ion implantation in the oxide films. It was found that the aqueous corrosion resistance of zirconium implanted with 5×1016 Zr ions/cm2 is the best in all the samples. Finally, the mechanism of the corrosion behavior of the self-ion implanted zirconium is discussed.更多还原