【摘要】 对磁控溅射沉积得到的CNx膜在不同温度下进行真空退火,退火前后CNx膜的化学键合采用X射线光电子能谱表征.结果发现,沉积的CNx膜中氮原子与sp,sp2,sp3杂化碳原子相键合,并对经过退火的CNx膜的键合结构和电子场发射特性的影响进行了研究.更多还原

【Abstract】 The carbon nitride films deposited by RF magnetron sputtering in a pure N₂ discharge were annealed in vacuum up to 900 ℃. The chemical bonding of the films was studied using X-ray photoelectron spectroscopy and Raman spectra. It was found that the nitrogen atoms were bound to sp, sp2 and sp3 hybridized carbon atoms in as-deposited films. The effects of the thermal annealing on the bonding structure and the electron field emission characteristics of CN_x films were investigated.更多还原