【摘要】 用电子束热蒸发方法在熔融石英基底上沉积了Al2O3和MgF2两种材料的单层膜,研究了两种材料的光学特性,采用光度法计算并给出了薄膜材料在180～230nm的折射率n和消光系数k的色散曲线。以两种材料作为高低折射率材料组合,采用1/4波长规整膜系设计并镀制了193nm的高反射膜,反射膜在退火后的反射率在193nm达到96%以上。结果表明在一定工艺条件下Al2O3和MgF2两种材料能够在193nm获得较好的光学性能,适用于高反射膜的制备。更多还原

【Abstract】 The single-layer films of Al₂O₃ and MgF₂ were deposited upon super polished fused-silica by electron-beam evaporation and were characterized. The subsequent optical constants n and k were reported for the spectral range of 180～230 nm. High-reflectivity （HR） Al₂O₃/MgF₂ mirrors were designed and produced for the wavelength of 193 nm. The annealed mirrors with a reflectance of more than 96% at 193nm were obtained. It was found that the single layers of Al₂O₃ and MgF₂ deposited according to optimized process could get suitable optical properties at 193 nm. And it was easier for HR mirrors to form the oxygen-deficient Al₂O₃ films than the single layers.更多还原