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HfO2薄膜的结构对抗激光损伤阈值的影响
Effects of the Structure of HfO2 Thin Films on Its Laser-induced Damage Threshold
【摘要】 利用蒸发氧化铪和离子辅助蒸发金属铪反应沉积氧化铪薄膜,对两种工艺下制备的氧化铪薄膜进行光学和结构以及激光损伤特性的研究 实验结果表明,用金属铪反应沉积的氧化铪薄膜不仅结构均匀,并且具有较高的激光损伤阈值 文章对损伤阈值和薄膜的结构及光学特性之间的关系进行了讨论.
【Abstract】 HfO 2 films have been deposited with electron beam evaporation of HfO 2 and ion assisted electron beam evaporation of Hf. Optical and structural properties and laser induce damage threshold of the films have been studied; it was found that HfO 2 film deposited with electron beam evaporation of Hf with ion assisted technology shows uniform structural properties and higher laser induced damage threshold. The relation between structural and damage threshold of HfO 2 films has also been studied.
【基金】 国家高技术 863基金资助
- 【文献出处】 光子学报 ,Acta Photonica Sinica , 编辑部邮箱 ,2005年02期
- 【分类号】O484.4
- 【被引频次】48
- 【下载频次】673