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X射线W/B4C宽带多层膜的优化设计和制备
Optimized Design and Fabrication of X-Ray W/B4C Broadband Multilayer Film
【摘要】 介绍了X射线宽带多层膜材料W和B4C的选定方法,依据伯宁(BERNING)公式确定出了在0.154 nm处X射线宽带多层膜的最佳膜对数。引入适当的评价函数,利用具有全局寻优特性且效率较高的遗传算法,在波长0.154 nm处优化设计出了掠入射角(θ)0.5°~0.9°范围内反射率值达到40%的宽角度宽带多层膜。宽带多层膜反射镜采用磁控溅射方法制备,并用X射线衍射仪对样品进行了检测,结果表明在掠入射角(2θ)1.0°~1.8°之间的相对反射率光谱曲线比较平坦。
【Abstract】 A method of selecting and confirming materials with W and B4C for X-ray broadband multilayer film is presented.The minimum bilayers number of X-ray broadband multilayer film has been confirmed by using BERNING formula at the wavelength 0.154 nm.After introducing the suitable merit function,a broad angular broadband W/B4C multilayer film has been designed successfully by using genetic algorithm.The flat reflectance of broadband multilayer film is 40% in the wavelength 0.154 nm at the grazing incidence angel (θ) of 0.5°~0.9°.The multilayer film has been fabricated on the magnetron sputtering system.A flat relative reflectance spectrum curve has been measured at the grazing incidence angle(2θ) of 1.0°~1.8° by X-ray diffractometer.
【Key words】 X-ray optics; broadband multilayer; merit function; genetic algorithms; magnetron sputtering;
- 【文献出处】 光学学报 ,Acta Optica Sinica , 编辑部邮箱 ,2005年10期
- 【分类号】TB383;
- 【被引频次】2
- 【下载频次】109