【摘要】 采用等离子热丝化学气相沉积(PHFCVD)装置进行了金刚石薄膜的制备实验。实验条件为:氢气流量为200sccm,甲烷流量为2~12sccm,基体温度为700~900℃,偏压为0~400V,真空室压力为4kPa。通过实验得出了甲烷含量、基体温度和偏压对沉积金刚石膜的影响,并运用扫描电子显微镜(SEM)、原子力显微镜(AFM)和X射线衍射(XRD)等测试方法对金刚石薄膜进行了观察分析。更多还原

【Abstract】 Diamond films were prepared by plasma assistant hotfilament chemical vapor deposition when the flow rate of H₂ was 200sccm,the flow rate of CH₄ was 2～12sccm,the substrate temperature was 700～900℃,the bias voltage was 0～400V and the pressure was 4kPa.It was found the effect of the flow rate of methane,substrate temperature and bias voltage on the deposition of the diamond films.At the same time,the diamond films were investigated by SEM,AFM and XRD.更多还原