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CoNbZr非晶软磁薄膜晶化动力学研究
The study of crystallization kinetics of CoNbZr amorphous soft magnetic thin films
【摘要】 采用 DSC热分析技术,结合 XRD、TEM和AFM实验,对磁控溅射制备的 Co85.5Nb8.9Zr5.6非晶合金软磁薄膜进行了变温和等温晶化动力学的研究。研究结果表明:升温晶化时,薄膜的晶化的表观激活能为99.82kJ/mol;局域激活能随晶化度增加;在等温晶化过程中,平均激活能为 88. 51kJ/mol, Avrami 指数1.17~1.39, 晶化行为主要是一维表面晶化,晶核长大受扩散控制的过程。
【Abstract】 The crystallization kinetics of magnetron sputtering Co85.5Nb8.9Zr5.6 amorphous alloy thin films have been investigated by differential scanning calorimeter (DSC), XRD,TEM and AFM methods. As a result, the apparent activation energy for crystallization of Co85.5Nb8.9Zr5.6 amorphous alloy thin films are obtained as (99.817) Kissinger methods. The local activation energy of non-isothermal crystallization was discussed to be average value Ec=100.53kJ/mol. For isothermal crystallization, the local activation energy of Co85.5Nb8.9Zr5.6 amorphous alloy thin films yields average value Ec=88.51kJ/mol. The local Avrami exponent was used for discussing the nucleation and growth behaviors, which was in rang of 1.17~1.39, the variation of results indicated that the main crystallization process in governed by one-dimensional diffusion controlled growth at a decreasing nucleation rate during isothermal crystallization.
【Key words】 crystallization kinetics; nanocrystalline; soft magnetic thin film;
- 【文献出处】 功能材料 ,Journal of Functional Materials , 编辑部邮箱 ,2005年02期
- 【分类号】TB383
- 【被引频次】12
- 【下载频次】215