【摘要】 采用 Ar、N2 和 SiH4 混合气体反应溅射制备了一系列不同 Si 含量的 Ti- Al- Si- N 薄膜,并采用EDS、AES、XRD、TEM和微力学探针研究了薄膜的微结构和力学性能。结果表明通过控制混合气体中SiH4 分压可以方便地获得不同 Si 含量的 Ti- Al -Si N纳米晶复合薄膜。当 Si 含量达到 3. 5% (原子分数)时,薄膜中出现 TiSix 界面相,造成(Ti,Al)N 晶粒细化,使薄膜力学性能得到提高,硬度和弹性模量的最高值分别为 36.0GPa和 400GPa。进一步提高 Si 含量,薄膜的力学性能逐渐降低。更多还原

【Abstract】 In this paper,Ti-Al-Si-N thin films were prepared with a mixture gas composed of argon,nitrogen and methane by the reactive sputtering method. EDS,AES,XRD,TEM and microindentor were employed to characterize their microstructures and mechanical properties. The results show that Ti-Al-Si-N nanocrystalline composite films different in silicon content can be conveniently prepared by controlling methane′s partial pressure in the mixture gas. When silicon content reaches 3.5at%,new phase TiSi_x appears in thin films,which contributes to the fining of (Ti,Al)N grains and then causes enhancement of thin films′ mechanical properties. At the same time,thin films′ hardness and elastic modulus reach their peak values respectively at 36.0GPa and 400 GPa. Further increasing silicon content leads to decline of thin films′ mechanical properties.更多还原