节点文献
曝光强度对卤化银微晶中载流子行为及其陷阱效应的影响
The Influence of Exposure Intensity on the Behavior of Carriers and the Trap Effect in Silver Halide Microcrystals
【摘要】 针对卤化银感光材料潜影形成过程中光作用动力学问题,分析了曝光强度对光生载流子行为和电子陷阱效应的影响,认为伴随着曝光强度的增加,影响光电子衰减的因素由电子陷阱起主要作用演化到电子陷阱和复合中心共同起作用进而演化到复合中心起主要作用.
【Abstract】 For the question of the photo-action kinetics in the formation process of latent image in silver halide material, the influences of exposure intensity on the behavior of photo-generation carriers and electron trap effect are analyzed. It is obtained that the main factor influencing the decay of photoelectrons evolves from electron traps to the combination of electron traps and recombination centers, and then to recombination centers.
【关键词】 电子陷阱;
复合中心;
曝光强度;
光电子;
光空穴;
卤化银;
【Key words】 electron trap; recombination center; exposure intensity; photoelectron; photohole; silver halide Corresponding author: LIU Rong-juan;
【Key words】 electron trap; recombination center; exposure intensity; photoelectron; photohole; silver halide Corresponding author: LIU Rong-juan;
【基金】 国家自然科学基金项目(10274017;10354001);河北省自然科学基金项目(103097);教育部重点项目(01011)资助课题.
- 【文献出处】 感光科学与光化学 ,Photographic Science and Photochemistry , 编辑部邮箱 ,2005年01期
- 【分类号】TQ571
- 【被引频次】4
- 【下载频次】54