节点文献
硬质合金表面化学镀Ni-P-金刚石粉沉积金刚石膜的研究
Study on Diamond Film Deposited on Cemented Carbide Substrate Plated Ni-P-diamond
【摘要】 利用直流等离子射流装置在以化学镀Ni-P-金刚石粉为过渡层的硬质合金上沉积金刚石薄膜。采用SEM、EDS和X射线衍射仪(XRD)初步探讨了金刚石薄膜的表面形貌和物相组成。结果表明硬质合金刀片表面化学镀Ni-P后沉积金刚石薄膜,金刚石成核密度小、晶形差,难以得到结晶质量良好的金刚石膜。而在硬质合金刀片表面化学镀Ni-P-金刚石粉后沉积金刚石薄膜,成核密度比较高,晶形多为(100),但结合力较差。
【Abstract】 The diamond film made by direct current plasma spraying CVD device on cemented carbide substrates chemical plated Ni-P-diamond is discussed. SEM, EDS and X-ray diffraction are used to study the structure and morphology of diamondfilm. The result shows that chemical plating Ni-P as intermediate transit layer on cemented carbide is disadvantageous to diamond film. However, chemical plating Ni-P-diamond is beneficial to diamond film, and density of nucleation is higher. The crystal form is almost (100), but the adhesion of diamond film is weaker.
【Key words】 diamond film; Ni-P-diamond chemical plating; interlayer; cemented carbide;
- 【文献出处】 工具技术 ,Tool Engineering , 编辑部邮箱 ,2005年09期
- 【分类号】TG174.4;
- 【被引频次】6
- 【下载频次】185