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硬质合金表面化学镀Ni-P-金刚石粉沉积金刚石膜的研究

Study on Diamond Film Deposited on Cemented Carbide Substrate Plated Ni-P-diamond

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【作者】 吴健匡同春

【Author】 Wu Jian Kuang Tongchun

【机构】 广东工业大学材料与能源学院华南理工大学 510643广州市硕士研究生

【摘要】 利用直流等离子射流装置在以化学镀Ni-P-金刚石粉为过渡层的硬质合金上沉积金刚石薄膜。采用SEM、EDS和X射线衍射仪(XRD)初步探讨了金刚石薄膜的表面形貌和物相组成。结果表明硬质合金刀片表面化学镀Ni-P后沉积金刚石薄膜,金刚石成核密度小、晶形差,难以得到结晶质量良好的金刚石膜。而在硬质合金刀片表面化学镀Ni-P-金刚石粉后沉积金刚石薄膜,成核密度比较高,晶形多为(100),但结合力较差。

【Abstract】 The diamond film made by direct current plasma spraying CVD device on cemented carbide substrates chemical plated Ni-P-diamond is discussed. SEM, EDS and X-ray diffraction are used to study the structure and morphology of diamondfilm. The result shows that chemical plating Ni-P as intermediate transit layer on cemented carbide is disadvantageous to diamond film. However, chemical plating Ni-P-diamond is beneficial to diamond film, and density of nucleation is higher. The crystal form is almost (100), but the adhesion of diamond film is weaker.

  • 【分类号】TG174.4;
  • 【被引频次】6
  • 【下载频次】185
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