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通过缩短显影时间提高微透镜阵列的填充因子与F数
Improving the Fill Factor and F Number of Refractive Microlens Array by Reducing Developing Time
【摘要】 采用缩短显影时间法改善了光刻胶热熔法制作微透镜阵列的工艺,提高了折射型微透镜阵列的F数(F#)与填充因子。由于显影时间不足,光刻胶突起部分的底部彼此连接,熔化后的微透镜也彼此连接,使微透镜阵列的填充因子得到了提高,达到了78.5%;另一方面,由于没有裸露的玻璃表面,使得常规方法下的光刻胶与玻璃基底的接触角变为光刻胶突起的底部与光刻胶基底的接触角,因此使接触角降低,达到3.944°,F#得到了提高,达到11.357。实验结果表明,该方法简便实用,效果良好。
【Abstract】 The fill factor and F number of refractive microlens array fabricated by melting photoresist are increased by reducing developing time.Because of the insufficiency of developing time,the bottoms of the protuberances are connected together so that the microlens are connected each other,and the fill factor is increased to 78.5%.On the other hand,because there is no bare glass substrate,the contact angle between the photoresist and the glass substrate is replaced by the one between the photoresist protuberance~·s bottoms and the photoresist substrate,so that the contact angle is reduced to 3.994° and the F number is increased to 11.357.The experimental results show that the methods of the paper are easy,practical and efficient.
【Key words】 refractive microlens array; melting photoresist; F number; reducing developing time;
- 【文献出处】 光电子·激光 ,Journal of Optoelectronics.laser , 编辑部邮箱 ,2005年02期
- 【分类号】TH74
- 【被引频次】20
- 【下载频次】213