节点文献
热丝CVD法沉积金刚石薄膜用灯丝研究现状及改进
RESEARCH AND IMPROVEMENT OF FILAMENTS FOR DEPOSITION OF DIAMOND THIN FILMS
【摘要】 热丝化学气相(CVD)法沉积金刚石具有其它沉积方法所无法比拟的优势而受到重视,然而在高温沉积过程中灯丝容易发生形变和挥发所带来的“污染”影响了金刚石沉积膜的质量,本文就热丝法中三种常用灯丝(钨丝、钼丝和铼丝)的高温行为的研究现状进行了综合评述。在此基础上,提出了钽丝表面包钨的新实验,以进一步指导热丝CVD法沉积高质量的金刚石。
【Abstract】 The deposition of diamond thin films by hot filament chemical vapor deposition(HFCVD)is very attractive due to its advantage compared with other techniques.However,the quality of films is influenced by deformation and contamination of the filament in the process of deposition at high temperature negatively.Recent development of three kinds of filaments are reviewed in detail.In the end,the idea of plating tantalum filament with tungesten is proposed to produce high quality diamond films.
【关键词】 HFCVD法;
金刚石;
灯丝;
碳化;
电阻;
【Key words】 HFCVD; diamond thin film; filament; carbonization; resistance;
【Key words】 HFCVD; diamond thin film; filament; carbonization; resistance;
- 【文献出处】 粉末冶金工业 ,Powder Metallurgy Industry , 编辑部邮箱 ,2005年06期
- 【分类号】TB43
- 【被引频次】16
- 【下载频次】457