【摘要】 用电沉积法制备了Ni S合金电极, 研究了电流密度、镀液温度、镀液pH值、电沉积时间、硫脲浓度对镀层硫含量的影响; 测试了不同硫含量的极化曲线; 并用XRD、SEM对镀层进行了表征。结果表明硫含量随着电流密度、pH值的增高而降低, 随着镀液温度的升高、电沉积时间增长而增高; 在硫脲浓度为100 g/L时硫含量最高。硫含量在12.5%~16.5%时, Ni S合金电极析氢电位较低。所获得的镀层有Ni3S2 活性成分, 并有部分非晶态。镀层经电解后, 变得更细, 更均匀。更多还原

【Abstract】 Ni-S alloy electrode was prepared by means of chemical electro-deposition method. The effects of current density, temperature, pH value, depositing time and thiourea concentration on sulfur content in the electro-deposited Ni-S electrode were studied. Polarization curves with different sulfur contents were determined. The phase and microstructure analysis were characterized by means of XRD and SEM. The results show that the sulfur content decreases with increasing current density and pH value, and increases with increasing temperature and electro-depositing time. With 100g/L thiourea concentration, the sulfur content reaches the max value. The lowest hydrogen-evolution overpotential achieve when the sulfur content is 12.5%16.5%. The coating contains Ni₃S₂ grain phase and partial amorphous structure, which becomes finer and more uniform after being electrolyzed.更多还原