【摘要】 脉冲电弧离子镀膜技术是近几十年来新发展的一种镀膜方法,有着广阔的应用前景.然而,在镀膜过程中,出现的拉弧和停弧现象严重影响了脉冲放电的稳定性,进而影响了膜层质量和镀膜效率.为此,采用两级电容充电的引弧方式来减拉弧现象;同时,使用双脉冲触发方法来提高放电的可靠性,减少停弧现象的产生.使用改进后的离子源实验表明,镀膜过程中拉弧和停弧现象明显减少,脉冲放电更为稳定.由此说明,对离子源放电稳定性的改造是有效的,能够很好的满足薄膜镀制的需要.更多还原

【Abstract】 The pulsed vacuum arc deposition(PVAD) is a new technique of coating,which is developed in recent decades,and have widely promising usage.But the stabiliyt of the discharging is influenced by the failure discharge and the stretching discharge,which lead to the poor quality of the film and the low efficiency of the coating.To resolve that,wto-order charging circuit is used to reduce the stretching discharge,and dipulse is used to increase the reliability of the idscharge,which can decrease the failure discharge.The experiment results which were done by using the reconstructed ion source show that the failure discharge and the stredtching discharge are reduced obviously,and the sischarge is more stable.It can be concluded that the reconstruction of the ion source is efficient,and the requirements of the coating can be needed.更多还原