【摘要】 采用直接蒙特卡罗方法对反应器中的气体分布进行粒子模拟,从而得到在不同条件下的一组结果,给出了粒子浓度和温度与腔体尺寸的关系图。并对结果作出分析比较,得出不同的条件对粒子浓度以及温度等产生影响,结果对ICP刻蚀的工艺控制有参考价值。更多还原

【Abstract】 A two-dimension direct simulation Mont Carlo (DSMC) Method of the rarefied reactive flow of neutral and ions in a low-pressure inductively coupled plasma reactor is presented. The relationship curves between the particle density and chamber dimension of plasma reactor are calculated and analyzed. Influence of different parameters on the particle density of plasma and temperature distribution in the ICP Etching technology is discussed according to the results of the simulation.更多还原