节点文献
分步式压印的空间位姿调整研究
Research on Parallel Positioning for Step Imprint Lithography
【摘要】 针对分步式压印光刻工艺超高精度对准及空间位姿调整要求,论述了一套由弹簧导轨承片台结构、驱动器及激光干涉仪构成的超高精度对准定位系统。为了消除由于压印力引起承片台空间位姿的变化,系统采用宏微两级驱动和优化的压印工艺实现承片台超高精度定位和空间位姿的调整;最终实现在压印光刻工艺中,定位精度小于20nm,空间位姿调整旋转量达到±10s。
【Abstract】 According to the need of ultra-precision alignment and 6DOF positioning for step imprint lithography process,spring tracks,PZT actuators and laser interferometers are used in imprint stage.In this system, optimization press process and coarse-fine actuating mode can realize the adjusting of stage’s 6DOF positioning,and the result is that the positioning accuracy is low 20nm,the rotation angles of the stage can reach to±10 seconds.
【关键词】 压印光刻;
承片台;
六自由度;
定位;
对准;
【Key words】 imprint lithography; stage; 6DOF; positioning; alignment;
【Key words】 imprint lithography; stage; 6DOF; positioning; alignment;
- 【文献出处】 弹箭与制导学报 ,Journal of Projectiles,Rockets,Missiles and Guidance , 编辑部邮箱 ,2005年S6期
- 【分类号】TN405
- 【被引频次】1
- 【下载频次】38