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银-纳米SiO2脉冲复合电镀工艺条件的优化与性能研究

Optimization of Ag-nano-SiO2 pulse composite electroplating process and properties of bath and deposits

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【作者】 苏永堂成旦红张庆王建泳郭长春

【Author】 SU Yong-tang, CHENG Dan-hong, ZHANG Qing, WANG Jian-yong, GUO Chang-chun

【机构】 上海大学理学院化学系上海大学环境与化学工程学院上海大学环境与化学工程学院 上海 200436上海 200436上海 200072上海 200072

【摘要】 采用正交试验,以镀层显微硬度为评价标准,得到银-纳米SiO2脉冲复合电镀的最佳工艺条件为:6mg/L的阳离子表面活性剂,100mg/L的非离子表面活性剂,15g/L的纳米SiO2,脉宽0.5ms,占空比40%,脉冲平均电流密度0.8-1.1A/dm2。正交试验结果表明,纳米SiO2含量对镀层的影响较大。该镀液分散能力(采用远近阴极法测定)为61%,覆盖能力近似为100%,镀层硬度为246.5HV,钎焊性较好。经研究发现,空气搅拌较机械搅拌更有利于纳米微粒在镀层中的分散。XRD测试得出,复合镀层在(111)面上的择优取向得到显著加强,进一步证实该镀层结晶致密,耐蚀性较纯银镀层好。

【Abstract】 By orthogonal test and using the micro-hardness of deposit as evaluation criterion, the process conditions of Ag-nano- SiO2 pulse composite electroplating were optimized as follows:6 mg/L of a cationic surfactant, 100 mg/L of a nonionic surfactant,15 g/L of nano-SiO2 particles, pulse width of 0.5 ms, duty ratio of 40% , pulse average current density of 0.8 - 1. 1 A/dm2. The results of orthogonal test show that the content of nano-SiO2 particles in bath has a great influence on the deposit. The bath has a throwing power (determined by far and near cathode method) of 61% and a covering power of near to 100% , and the deposit has a micro-hardness of 246.5 HV and good solderability. Moreover, air agitation is found to be more favourable to the dispersion of nano-particles in the deposit than mechanical agitation. XRD test demonstrates that the composite deposit has a obviously stronger preferred orientation of (111) surface, which further proves that the deposit has dense crystal structure and better corrosion resistance than pure silver deposit.

  • 【文献出处】 电镀与涂饰 ,Electroplating & Finishing , 编辑部邮箱 ,2005年10期
  • 【分类号】TQ153;
  • 【被引频次】12
  • 【下载频次】174
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